Semiconductor device

Active solid-state devices (e.g. – transistors – solid-state diode – Heterojunction device – Field effect transistor

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H01L 310328

Patent

active

061076546

ABSTRACT:
There is provided a semiconductor device having a novel structure in which high operating performance and high reliability can be achieved at the same time.
In an active region 102 sandwiched by a source region 101 and a drain region 103 constituted by a crystalline semiconductor, a Si.sub.X Ge.sub.1-X (0<X<1) region 105 is formed by doping the same with germanium locally. The expansion of a depletion layer from the drain toward the source is effectively suppressed utilizing the difference in the band structures of the Si.sub.X Ge.sub.1-X region 105 and a Si region 106 doped with no germanium.

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