Semiconductor constructions

Active solid-state devices (e.g. – transistors – solid-state diode – With means to control surface effects – Insulating coating

Reexamination Certificate

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Details

C257S639000, C257S640000, C257S649000, C438S082000, C438S725000, C438S736000

Reexamination Certificate

active

06943432

ABSTRACT:
The invention includes a semiconductor construction comprising a semiconductor substrate, and a first layer comprising silicon and nitrogen over the substrate. A second layer comprising at least 50 weight% carbon is over and physically against the first layer, and a third layer consisting essentially of a photoresist system is over and physically against the second layer. The invention also includes methodology for forming the semiconductor construction.

REFERENCES:
patent: 6030541 (2000-02-01), Adkisson et al.
patent: 6121133 (2000-09-01), Iyer et al.
patent: 6136511 (2000-10-01), Reinberg et al.
patent: 6403280 (2002-06-01), Yamahara et al.
patent: 6605394 (2003-08-01), Montgomery et al.
patent: 2002/0045130 (2002-04-01), Nitta et al.
patent: 2003/0008245 (2003-01-01), Cheng et al.
Website: “Clinically Amplified Photoresists,” http://www.almaden.ibm st projects sub160nm obectives ca. Printed Dec. 31, 2001, 1 page.
Bukofsky, S.J., et al., “Imaging of Photogenerated Acid in a Chemically Amplified Photoresist,” App. Phys. Letters, vol. 73, No. 3, Jul. 20, 1998, pp. 408-410.
Website: “Clinically Amplified Photoresists.” http://www.almaden.ibm/st/projects/subioonm/objectives/ca. Printed Dec. 31, 2001. 1 page.

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