Semiconductor cleaning using superacids

Cleaning compositions for solid surfaces – auxiliary compositions – Cleaning compositions or processes of preparing – For cleaning a specific substrate or removing a specific...

Reexamination Certificate

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C510S176000, C510S177000, C510S178000, C134S001300, C134S042000, C134S902000, C438S906000

Reexamination Certificate

active

07923424

ABSTRACT:
A method of cleaning a substrate includes contacting a surface of a semiconductor substrate with a composition comprising a superacid. The semiconductor substrate may be a wafer.

REFERENCES:
patent: 5221423 (1993-06-01), Sugino et al.
patent: 5302240 (1994-04-01), Hori et al.
patent: 5965465 (1999-10-01), Rath et al.
patent: 6092539 (2000-07-01), Chang et al.
patent: 6147002 (2000-11-01), Kneer
patent: 6200891 (2001-03-01), Jagannathan et al.
patent: 6379634 (2002-04-01), Fields et al.
patent: 6624127 (2003-09-01), Brask et al.
patent: 6817385 (2004-11-01), Sloan et al.
patent: 2001/0056052 (2001-12-01), Aoki et al.
patent: 2002/0155724 (2002-10-01), Sakai et al.
patent: 2003/0003762 (2003-01-01), Cotte et al.
patent: 2004/0211675 (2004-10-01), Dong et al.
patent: 2004/0217006 (2004-11-01), Small
patent: 2005/0106890 (2005-05-01), Schroeder et al.
patent: 2005/0176602 (2005-08-01), Hsu
patent: 2006/0040499 (2006-02-01), Walther et al.
patent: 2006/0154839 (2006-07-01), Ilardi et al.
patent: 2006/0183654 (2006-08-01), Small
patent: 2007/0060490 (2007-03-01), Skee
patent: 2373367 (2002-09-01), None
patent: 2004-285354 (2004-10-01), None
patent: 2001-0058668 (2001-07-01), None
patent: WO 02/086045 (2002-10-01), None
CAS AN 1969:81561 (1969).
Lu et al., “Studies of the chemically amplified development-free vapor photolithography”, Journal of Photochemistry and Photobiology A: Chemistry, 1997, 110, 313-316.
P. Mumbauer et al., “Mist Deposition in Semiconductor Device Manufacturing,”Semiconductor International, Nov. 1, 2004, www.semiconductoronline.com.
Steven Verhaverbeke, “An Investigation of the Critical Parameters of a Atomized, Accelerated Liquid Spray to Remove Particles,” presented at the 208th Meeting of the Electrochemical Society, Los Angeles, California, Oct. 16-21, 2005, symposium on Cleaning Technology in Semiconductor Device Manufacturing IX, Electronics and Photonics/Dielectric Science and Technology.
Ken-Ichi Sano et al., “Single Wafer Wet Cleaning for a High Particle Removal Efficiency on Hydrophobic Surface,” presented at the 208th Meeting of the Electrochemical Society, Los Angeles, California, Oct. 16-21, 2005, symposium on Cleaning Technology in Semiconductor Device Manufacturing IX, Electronics and Photonics/Dielectric Science and Technology.
Michael Freemantle, “Mixed Solids Form Low Freezing Liquids,”Chem. Eng. News, Sep. 12, 2005, 36-38.
Andrew P. Abbott et al., “Novel solvent properties of choline chloride/urea mixtures,”Chem. Comm., Jan. 7, 2003, 70-71.
Andrew P. Abbott et al., “Deep Eutectic Solvents Formed between Choline Chloride and Carboxylic Acids: Versatile Alternatives to Ionic Liquids,”J. Am. Chem. Soc. 2004, vol. 126, 9142-9147.
A. J. Mestel, “The Electrohydrodynamic Cone-Jet at High Reynolds Number,”Journal of Aerosol Science, 1994, vol. 25, No. 6, 1037-1047.
I. Hayati et al., “Mechanism of stable jet formation in electrohydrodynamic atomization,”Nature, Jan. 2, 1986, vol. 319, 41-43.
H. Kikuchi, “New Aspects of Atmospheric Electro-Sciences Based on EHD (Electrohydrodynamics) and Their Application to Destruction of Tornadic Thunderstorms,”Geophysical Research Abstracts, vol. 6, 06713, 2004.
Utkan Demirci et al., “Micromachined Microdroplet Ejector Arrays,” Stanford University, E.L. Ginzton Laboratory, Stanford, CA, undated.
“An Interview with Tom Welton,” ESI Special Topics, May 2004.
Successful “Green” Solvent Found for Problematic Chemicals, University of Notre Dame, May 7, 1999.
Ionic Liquids. Profile of Queen's University Belfast, School of Chemistry. ESI Special Topics, May 2004.
Michael Klein, Getting the Jump on Superacids, University of Pennsylvania, dated Oct. 25, 2000, http://www.psc.edu/science/2000/klein/getting—jump—on—superacids.pdf.
Supersonic Gas-Liquid Cleaning System, NASA Technology Transfer, RTI Technology Applications, undated, 2 pages.
Overview, SCI-Bytes, undated, 2 pages.
Ionic Liquids. Organic/Inorganic Synthesis, Sigma-Aldrich, undated.
New Ionic Liquids, Sigma-Aldrich, undated.
Invitation pursuant to Rule 62a(1) EPC, European patent application No. 06 734 759.1, dated May 27, 2010.
Supplementary European Search Report, European patent application No. 06 734 759.1, dated Aug. 20, 2010.

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