Semiconductor cleaning apparatus and wafer cassette

Details Semiconductor cleaning apparatus and wafer cassette Semiconductor cleaning apparatus and wafer cassette

1993-09-20

1995-08-29

Coe, Philip R.

Cleaning and liquid contact with solids

Apparatus

Sequential work treating receptacles or stations with means...

134902, B08B 304

Patent

active

054451710

ABSTRACT:
A semiconductor cleaning apparatus having: a loader/unloader portion for injecting/ejecting a product cassette which accommodates a wafer; a product injecting/ejecting portion for injecting/ejecting the wafer from the product cassette; a cleaning portion for cleaning the wafer; a water cleaning portion for, with water, cleaning the wafer which has been cleaned in the cleaning portion; a drying portion for drying the wafer which has been cleaned with water in the water cleaning portion; and a conveyance portion having a wafer hand for directly holding the wafer ejected from the product cassette in the product injecting/ejecting portion and sequentially conveying the wafer held by the wafer hand to the cleaning portion, the water cleaning portion and the drying portion.

REFERENCES:
patent: 4208760 (1980-06-01), Dexter et al.
patent: 4974619 (1990-12-01), Yu
patent: 4985722 (1991-01-01), Ushijima et al.
patent: 5092011 (1992-03-01), Gommori et al.
patent: 5168886 (1992-12-01), Thompson et al.
patent: 5191908 (1993-03-01), Hiroe et al.
patent: 5301700 (1994-04-01), Kamikawa et al.

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