Cleaning and liquid contact with solids – Apparatus – Sequential work treating receptacles or stations with means...
Patent
1995-07-17
1996-10-29
Coe, Philip R.
Cleaning and liquid contact with solids
Apparatus
Sequential work treating receptacles or stations with means...
134902, B08B 304
Patent
active
055688217
ABSTRACT:
A semiconductor cleaning apparatus includes a cassette loader/unloader for moving a cassette; a product loader/unloader for loading a wafer into and unloading a wafer from a cassette; a cleaner for cleaning a wafer; a water cleaner for cleaning with water a wafer that has been cleaned in the cleaner; a dryer for drying the wafer that has been cleaned with water in the water cleaner; and a conveyance having a wafer grasping hand for directly holding a wafer unloaded from a cassette and sequentially conveying the wafer held by the wafer hand to the cleaner, the water cleaner, and the dryer.
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Fujino Naohiko
Kotoh Satoru
Nishimoto Akira
Ohmori Masashi
Sasai Hiroshi
Coe Philip R.
Mitsubishi Denki & Kabushiki Kaisha
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