Semiconductor cleaning and production methods using a film repul

Details Semiconductor cleaning and production methods using a film repul Semiconductor cleaning and production methods using a film repul

1996-09-05

2000-02-29

Scheiner, Laurie

Cleaning and liquid contact with solids

Processes

Including application of electrical radiant or wave energy...

134 2, 134 3, B08B 600, C25F 100, C25F 330, C25F 500

Patent

active

060296798

ABSTRACT:
By employing a cleaning method wherein a substrate such as Si wafer is covered with a film having electrostatic repulsive force or a substance capable of controlling a zeta potential so as to prevent or remarkably reduce adhesion of fine particles present in a cleaning solution or etching solution, electronic parts can be produced in higher yield and lower cost.

REFERENCES:
patent: 5079129 (1992-01-01), Roth et al.
patent: 5409544 (1995-04-01), Ota et al.
patent: 5472513 (1995-12-01), Shiramizu
patent: 5557147 (1996-09-01), Sugiura et al.
patent: 5614352 (1997-03-01), Rahman

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