Semiconductor circuit manufacturing apparatus having selectively

Radiant energy – Photocells; circuits and apparatus – Photocell controls its own optical systems

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356400, 364559, G01B 1127

Patent

active

047193573

ABSTRACT:
A semiconductor circuit manufacturing apparatus wherein a wafer has a plurality of zones to be exposed one by one to a pattern of a mask, including detector apparatus for detecting a relative position between the mask and a said zone to be exposed and producing outputs representative of the relative position; a device for exposing the said zone to the mask pattern after they are aligned; a device for producing information for identifying said zone which is going to be exposed; a selector, responsive to said information producing device, for selecting all or a part of the outputs of said detecting apparatus; and a device for determining, on the basis of the selected outputs of said detecting apparatus, a positional deviation between the mask pattern and the zone to be exposed thereto.

REFERENCES:
patent: 4315201 (1982-02-01), Suzuki et al.
patent: 4328553 (1982-05-01), Fredriksen et al.
patent: 4362385 (1982-12-01), Lobach
patent: 4515481 (1985-05-01), Yamada et al.

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