Semiconductor calibration structures and calibration wafers for

Measuring and testing – Instrument proving or calibrating – Volume of flow – speed of flow – volume rate of flow – or mass...

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

216 2, 216 84, 438 14, 427336, G01N 1102

Patent

active

060949651

ABSTRACT:
Semiconductor wafer coating system calibration structures and methods are described. In one embodiment, a calibration structure includes a perimetral edge bounding a calibration body. A calibration edge is spaced from the perimetral edge and is positioned over the calibration body. Together, the edges define a distance therebetween which is configured to calibrate a wafer coating system. In a preferred embodiment, the edges define respective termination distances configured to calibrate multiple different wafer coating systems. In another embodiment, a calibration pattern is formed over a semiconductor wafer. A layer of material is formed over the calibration pattern by a coating system, and selected portions thereof removed by the system. The positions of unremoved portions of the layer of material are inspected relative to the calibration pattern to ascertain whether the coating system removed the selected portions within desired tolerances. If not, the coating system is calibrated to within desired tolerances.

REFERENCES:
patent: 4875989 (1989-10-01), Davis et al.
patent: 5392113 (1995-02-01), Sayka et al.
patent: 5425846 (1995-06-01), Koze et al.
patent: 5426073 (1995-06-01), Imaoka et al.
patent: 5444921 (1995-08-01), Milina
patent: 5593925 (1997-01-01), Yamaha
patent: 5618380 (1997-04-01), Siems et al.
patent: 5675402 (1997-10-01), Cho et al.
patent: 5723385 (1998-03-01), Shen et al.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Semiconductor calibration structures and calibration wafers for does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Semiconductor calibration structures and calibration wafers for , we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Semiconductor calibration structures and calibration wafers for will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-653088

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.