Semiconductor batch heating assembly

Details Semiconductor batch heating assembly Semiconductor batch heating assembly

2007-12-25

2007-12-25

Fuqua, Shawntina (Department: 3742)

Electric heating

Heating devices

Combined with container, enclosure, or support for material...

C219S405000, C219S411000, C219S406000, C118S724000, C118S725000, C118S050100, C392S416000, C392S418000

Reexamination Certificate

active

11548598

ABSTRACT:
A heat treatment apparatus for use in batch heating/wafer processing is provided, which comprises a process chamber for receiving a wafer boat, at least a heating element comprising a substrate body configured to form an electrical heating circuit for at least one heating zone and encapsulated in a continuous overcoat layer, a heat reflector comprising a heat reflective surface disposed on the heating element, and the heating element has a ramp rate of at least 1° C. per second for heating the wafers in the wafer boat.

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