Semiconductor array and method for its manufacture

Fishing – trapping – and vermin destroying

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257 69, 257204, H01L 2170

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052683230

ABSTRACT:
A semiconductor array in a CMOS technology is described in which the gate electrodes are of p.sup.+ -doped polysilicon in the case of p-channel transistors and of n.sup.+ -doped polysilicon in the case of n-channel transistors. If the gate electrodes of two complementary transistors are connected at the gate level, a polysilicon diode is created at the connection point. In accordance with the invention, the polysilicon diode is short-circuited with a polysilicide layer. A method is described for short-circuiting this polysilicon diode without additional masking steps using a metal silicide layer. In a further embodiment of the invention, the silicide is restricted to the area of the polysilicon diode. In addition, a method is described using which the polysilicon diodes can be short-circuited in a self-adjusting polysilicide process.

REFERENCES:
patent: 4703552 (1987-11-01), Baldi et al.
patent: 4804636 (1989-02-01), Groover, III et al.
patent: 4890141 (1989-12-01), Tang et al.
patent: 5010032 (1991-04-01), Tang et al.
patent: 5190886 (1993-03-01), Asahina
IBM Technical Disclosure Bulletin, vol. 32, No. 3B, Aug., 1989, "CMOS Processes With Low Resistance p- And n-Doped Gates".

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