Active solid-state devices (e.g. – transistors – solid-state diode – With means to control surface effects – Insulating coating
Patent
1998-12-31
2000-12-19
Hardy, David
Active solid-state devices (e.g., transistors, solid-state diode
With means to control surface effects
Insulating coating
257649, 257774, H01L 23535
Patent
active
061630675
ABSTRACT:
A semiconductor apparatus and a process for fabricating the same according to the invention permit reduction in width of a wiring pattern of the semiconductor apparatus and in distance between wiring elements. A stopper film and an insulating film are provided on a substrate. The etching rate of RIE for the insulating film is greater than that for the stopper film. The stopper film and insulating film are formed on the insulating film. A pattern of the contact hole is formed in the stopper film. A wiring pattern is formed on the resist film. The insulating films are etched by RIE with the resist film and stopper film used as masks. Thus, a groove for formation of wiring and a contact hole for formation of a contact plug are simultaneously formed in a self-alignment manner.
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Inohara Masahiro
Matsuno Tadashi
Shibata Hideki
Hardy David
Kabushiki Kaisha Toshiba
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