Semiconductor apparatus and cleaning unit thereof

Details Semiconductor apparatus and cleaning unit thereof Semiconductor apparatus and cleaning unit thereof

2006-05-05

2009-12-22

MacArthur, Sylvia R. (Department: 1792)

Adhesive bonding and miscellaneous chemical manufacture

Differential fluid etching apparatus

For liquid etchant

C156S345170, C134S104100

Reexamination Certificate

active

07635417

ABSTRACT:
A semiconductor apparatus for processing a wafer comprises a stage, a fluid supply unit, and a cleaning unit. The stage supports the wafer. The fluid supply unit provides a first fluid, wherein the fluid supply unit is moveable between a second position and a first position. The cleaning unit provides a second fluid, wherein when the fluid supply unit is in the first position, the fluid supply unit provides the first fluid toward the wafer, and when the fluid supply unit is in the second position, the cleaning unit blows the second fluid toward a surface of the fluid supply unit to clean the surface thereof.

REFERENCES:
patent: 6210481 (2001-04-01), Sakai et al.
patent: 6357457 (2002-03-01), Taniyama et al.
patent: 7479205 (2009-01-01), Okuda et al.

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