Semiconducting device having graphene channel

Active solid-state devices (e.g. – transistors – solid-state diode – Thin active physical layer which is – Heterojunction

Reexamination Certificate

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C257SE21448, C438S195000

Reexamination Certificate

active

07952088

ABSTRACT:
The present invention, in one embodiment, provides a semiconductor device including a substrate having an dielectric layer; at least one graphene layer overlying the dielectric layer; a back gate structure underlying the at least one graphene layer; and a semiconductor-containing layer present on the at least one graphene layer, the semiconductor-containing layer including a source region and a drain region separated by an upper gate structure, wherein the upper gate structure is positioned overlying the back gate structure.

REFERENCES:
patent: 2003/0211649 (2003-11-01), Hirai et al.
patent: 2005/0212014 (2005-09-01), Horibe et al.
patent: 2006/0099750 (2006-05-01), DeHeer et al.
patent: 2007/0014151 (2007-01-01), Zhang et al.
Iikawa et al , “Metamorphosis of Ultra-Thin Top Si Layer of SOI Substrate Into 3C-Sic Using Rapid Thermal Process” H., Osaka Prefecture University, 2004IMFEDK.
John Toon, “Carbon-Based Electronics: Researchers Develop Foundation Circuitry and Devices Based on Graphite”, Georgia Research Tech News, Mar. 14, 2006.
Peter Singer, “Graphene-Based Devices Use Electron Diffraction”, Semiconductor International, Reed Business Information, 2006.

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