Semi-internally manifolded interconnect

Chemistry: electrical current producing apparatus – product – and – With pressure equalizing means for liquid immersion operation

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

429 38, 429 39, H01M 810, H01M 214

Patent

active

053764722

ABSTRACT:
A semi-internally manifolded interconnect structured for placement between successive electrolyte elements in stack of elements having a first surface with a level margin extending substantially around the perimeter of the interconnect, first and second manifold channels disposed inward from the margin, and a plurality of gas-flow channels disposed in a central area of the first surface and extending between and in fluid communication with the first and second manifold channels.

REFERENCES:
patent: 3394032 (1968-07-01), Danner
patent: 4476196 (1984-10-01), Poeppel et al.
patent: 4476197 (1984-10-01), Herceg
patent: 4499663 (1985-02-01), Zwick et al.
patent: 4510212 (1985-04-01), Fraioli
patent: 4640875 (1987-02-01), Makiel
patent: 4732822 (1988-03-01), Wright et al.
patent: 4753857 (1988-06-01), Hosaka
patent: 4761349 (1988-08-01), McPheeters et al.
patent: 4853301 (1989-08-01), Granata et al.
patent: 4877506 (1989-11-01), Fee et al.
patent: 4913982 (1990-04-01), Kotchick et al.
patent: 4963442 (1990-10-01), Marianowski et al.
patent: 5045413 (1991-09-01), Marianowski et al.
patent: 5227256 (1993-07-01), Marianowski et al.
patent: 5252409 (1993-10-01), Akagl

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Semi-internally manifolded interconnect does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Semi-internally manifolded interconnect, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Semi-internally manifolded interconnect will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-918258

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.