Fishing – trapping – and vermin destroying
Patent
1987-06-04
1988-11-01
Hearn, Brian E.
Fishing, trapping, and vermin destroying
148DIG23, 148DIG110, 148DIG56, 156613, 156614, 437104, 437959, 437987, H01L 21285, H01L 21205, H01L 736
Patent
active
047820349
ABSTRACT:
Semi-insulating epitaxial layers of Group III-V based semiconductor compounds are produced by an MOCVD process through the use of bis arene titanium sources, such as cyclopentadienyl cycloheptatrienyl titanium and bis (benzene) titanium.
REFERENCES:
patent: 3492175 (1970-01-01), Conrad et al.
patent: 3519479 (1970-07-01), Inoue et al.
patent: 3619288 (1971-11-01), Sirtl
patent: 3702780 (1972-11-01), Withers
patent: 3867202 (1975-02-01), Ichiki et al.
patent: 3979235 (1976-09-01), Boucher
patent: 4031274 (1977-06-01), Bessen
patent: 4193835 (1980-03-01), Inoue et al.
patent: 4202893 (1980-05-01), Cox
patent: 4310567 (1982-01-01), Tobata et al.
patent: 4328261 (1982-05-01), Heinecke et al.
patent: 4368098 (1983-01-01), Manasevit et al.
Tokahashi et al., "Chemical Vapor Deposition of TiO.sub.2 Film Using an Organometallic Process . . . ", J. Chem. Soc., Faraday 1, 1981, 77, 1051-7.
Cockayne et al., "Preciptate Identification in Ti-, Cr- and Ni-Doped InP Single Crystals," J. Crys. Growth, 76, (1980), pp. 251-258.
Moss, R. H. and Evans, J. S., "A New Approach to MOCVD of Indium Phosphide and Gallium-Indium Arsenide," 1981, pp. 129-134, Journal of Crystal Growth, North-Holland Publishing Company.
Bass, S. J. et al., "Metal Organic Vapour Phase Epitaxy of Indium Phosphide," 1983, pp. 68-75, Journal of Crystal Growth 64, North-Holland Publishing Company.
Hsu, C. C. et al., "OMVPE Growth of InP Using TMIn," 1983, pp. 8-12, Journal of Crystal Growth 63, North-Holland Publishing Company.
Hurle, D. T. J. et al., "GaInAs and GaInAsP Materials Grown by Low Pressure MOCVD for Microwave and Optoelectronic Applications," 10/81, pp. 64-73, Journal of Crystal Growth, North-Holland Publishing Company.
Alferov, Ah I. et al., "Buried InGaAsP/InP Stripe Heterojunction cw Lasers Fabricated by Combined Liquid- and Gas-Phase Epitaxy," 6/82, pp. 296 and 299, Soviet Technical Physics Letters.
Long, J. A. et al., "Growth of Fe-Doped Semi-Insulating InP by MOCVD," 5/84, pp. 10-14, Journal of Crystal Growth, North-Holland, Amsterdam.
Speier, P. et al., "MOVPE Growth and Characteristics of Fe-Doped Semi-Insulating InP Layers," 11/86, vol. 22, No. 23, pp. 1216-1217, Electronics Letters.
Nakai, K. et al., "Growth of Iron-Doped Epitaxial Layers for GaAs Field Effect Transistors," 10/77, vol. 124, No. 10, pp. 1635-1640, J. Electrochem. Soc.:Solid-State Science and Technology.
Brandt, C. D. et al., "New Semi-Insulating InP: Titanium Midgap Donors," 4/86, Applied Physics Letters, 48(17).
Van Oven, H. O. and De Liefde Meijer, H. J., "Cyclopentadienylcycloheptatrienyltitanium," pp. 159-163, Journal of Organometallic Chemistry, vol. 23, 1970.
Dentai Andrew G.
Joyner, Jr. Charles H.
Weidman Timothy W.
Zilko John L.
American Telephone and Telegraph Company AT&T Bell Laboratories
Bunch William
Hearn Brian E.
Ranieri Gregory C.
LandOfFree
Semi-insulating group III-V based compositions doped using bis a does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Semi-insulating group III-V based compositions doped using bis a, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Semi-insulating group III-V based compositions doped using bis a will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-890806