Image analysis – Applications – Manufacturing or product inspection
Reexamination Certificate
2007-12-12
2011-12-06
Kim, Robert (Department: 2881)
Image analysis
Applications
Manufacturing or product inspection
C382S141000, C382S144000, C382S147000, C382S151000, C250S306000, C250S307000, C250S310000, C250S311000, C700S121000
Reexamination Certificate
active
08073242
ABSTRACT:
This invention relates to a SEM system constructed to create imaging recipes or/and measuring recipes automatically and at high speed, and improve inspection efficiency and an automation ratio, and to a method using the SEM system; a method for creation of imaging recipes and measuring recipes in the SEM system is adapted to include, in a recipe arithmetic unit, the steps of evaluating a tolerance for an imaging position error level at an evaluation point, evaluating a value predicted of the imaging position error level at the evaluation point when any region on circuit pattern design data is defined as an addressing point, and determining an imaging recipe and a measuring recipe on the basis of a relationship between the tolerance for the imaging position error level at the evaluation point and the predicted value of the imaging position error level at the evaluation point.
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Matsuoka Ryoichi
Miyamoto Atsushi
Morokuma Hidetoshi
Nishiura Tomofumi
Antonelli, Terry Stout & Kraus, LLP.
Hitachi High-Technologies Corporation
Kim Robert
Logie Michael
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