Etching a substrate: processes – Forming or treating material useful in a capacitor
Reexamination Certificate
2008-09-23
2008-09-23
Alanko, Anita K (Department: 1792)
Etching a substrate: processes
Forming or treating material useful in a capacitor
C216S039000, C216S080000, C216S097000, C219S121690, C029S623100, C029S623500
Reexamination Certificate
active
10868447
ABSTRACT:
A method of preparing high capacity hydrous ruthenium oxide micro-ultracapacitors. A laser direct-write process deposits a film of hydrous ruthenium oxide in sulfuric acid under ambient temperature and atmospheric conditions. A dual laser process combining infrared and ultraviolet light is used for fabricating a complete wet electrochemical cell in a single processing step. Ultraviolet laser micromachining is used to tailor the shape and size of the deposited material into planar electrodes. The micro-ultracapacitors have improved size, weight, and cost efficiency and exhibit high specific power and high specific energy.
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Arnold Craig B.
Pique Alberto
Alanko Anita K
Hunnius Stephen T
Karasek John J
Ressing Amy
The United States of America as represented by the Secretary of
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