Self-compensating mark design for stepper alignment

Active solid-state devices (e.g. – transistors – solid-state diode – Alignment marks

Reexamination Certificate

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C257S620000

Reexamination Certificate

active

07067931

ABSTRACT:
A system and method for fabricating integrated circuits using four fine alignment targets per stepper shot. The four alignment targets are disposed within the scribe line on each side of a four-sided stepper shot. The targets on opposites sides of the region are located in mirror-image positions. For example, in a square or rectangular region, the targets could be at the mid-point of each side, or at each corner. Because the scribe lines for adjoining stepper shots overlap, a target in one shot will overlay a target from a preceding shot. In a positive resist process, for example, the target resulting from the overlay will be reduced in size by an amount corresponding to the amount of rotational error, if any. However, the target will still indicate the center of the stepper shot, thereby compensating for the rotational error with no further measurements.

REFERENCES:
patent: 4849313 (1989-07-01), Chapman et al.
patent: 5250983 (1993-10-01), Yamamura
patent: 5414514 (1995-05-01), Smith et al.
patent: 5777392 (1998-07-01), Fujii
patent: 6071656 (2000-06-01), Lin
patent: 6151120 (2000-11-01), Matsumoto et al.
patent: 6172409 (2001-01-01), Zhou
patent: 0715215 (1996-06-01), None
Danny Banks, “Introduction to Microengineering,” Demon Co., England, (1999) pp. 2-3.
Ultratech Stepper, Ultratech Model 1000 Stepper Poduct Sheet (2000).
Stanley Wolf and Richard N. Tauber, Silicon Processing for the VLSI Era, vol. 1, Lattice Press, Sunset Beach, CA. (1986) p.478.

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