Surgery – Means for introducing or removing material from body for... – Treating material introduced into or removed from body...
Patent
1995-03-20
1996-10-08
Green, Randall L.
Surgery
Means for introducing or removing material from body for...
Treating material introduced into or removed from body...
604329, 604349, 128761, A61M 2900
Patent
active
055626220
ABSTRACT:
An urethral drain having deep external drainage channels, a low-profiled bladder retention segment, and a reversibly detachable collection segment, facilitates the draining of urine and fluids from the bladder. The low-profiled retention means minimizes bladder irritations and the deep external channels reduce the occurrence of infections. Incorporation of a reduced diameter smooth segment on the catheter, proximate the location of the external urethral sphincter allows the patient to void normally and at will. The drain can be worn concealed within the urethra. Flushing action from normal voiding washes out particulate matters in the urethra and the concealed drain further minimizes contamination. Together, these features improve quality of life for patients needing catheterization.
REFERENCES:
patent: 2450217 (1948-09-01), Alcorn
patent: 3260258 (1966-07-01), Berman
patent: 3490456 (1970-01-01), Kortum
patent: 3769981 (1973-11-01), McWhorter
patent: 3774591 (1973-11-01), Corbin
patent: 3811450 (1974-05-01), Lord
patent: 3815608 (1974-06-01), Spinosa
patent: 3821956 (1974-07-01), Gordhamer
patent: 4398910 (1983-08-01), Blake
patent: 4710169 (1987-12-01), Christopher
patent: 4723946 (1988-02-01), Kay
patent: 4738667 (1988-04-01), Galloway
ContiMed, Inc.
Green Randall L.
Smith Chalin
LandOfFree
Self-cleansing bladder drainage device does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Self-cleansing bladder drainage device, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Self-cleansing bladder drainage device will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-53840