Self-cleaning method for semiconductor exposure apparatus

Details Self-cleaning method for semiconductor exposure apparatus Self-cleaning method for semiconductor exposure apparatus

2005-12-27

2005-12-27

Nguyen, Henry Hung (Department: 2851)

Photocopying

Projection printing and copying cameras

Step and repeat

C355S067000, C355S030000

Reexamination Certificate

active

06980278

ABSTRACT:
To an original plate holder16to which an original pattern plate15is set in ordinary exposure, a transmittable plate20having a concave-shaped concave portion22formed at a middle of a quartz glass plate is set in self-cleaning and irradiated with ultraviolet light emitted from a light source11. The ultraviolet light is diffused through the concave lens of the transmittable plate20and an entire surface of a projection lens17is irradiated with it. Accordingly, molecular bonds of a contaminant adhering to the surface of the projection lens17are cut off with strong energy of the ultraviolet light, so that the contaminant is decomposed, vaporized, and then removed.

REFERENCES:
patent: 5981960 (1999-11-01), Ooaeh et al.
patent: 6268904 (2001-07-01), Mori et al.
patent: 6411368 (2002-06-01), Matsumoto et al.
patent: 05-335206 (1993-12-01), None
patent: 11-224839 (1999-08-01), None
patent: 2002-246296 (2002-08-01), None

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