Self cleaning flow control orifice

Details Self cleaning flow control orifice Self cleaning flow control orifice

1990-04-24

1992-05-19

Beck, Shrive

Coating apparatus

Gas or vapor deposition

118733, 118719, 152565, C23C 1600, C23C 1654

Patent

active

051137895

ABSTRACT:
A self cleaning flow control orifice mounted in an exhaust line. A toroid having a rounded inner surface is mounted in the exhaust line and forms an orifice. A cleaning device is mounted in a manner to provide close contact between the cleaning device and the rounded surface. The toroid and cleaning device are rotated relative to one another so that the cleaning device rides over the rounded surface to clean the surface. The clean surface thereby insures proper functioning of the exhaust system of an atmospheric pressure chemical vapor deposition apparatus used to deposit films on substrates and wafers.

REFERENCES:
patent: 4834020 (1989-05-01), Bartholomew et al.
patent: 4982610 (1991-01-01), Gordon et al.

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