Self-cleaning developer applicator

Coating apparatus – With means to apply electrical and/or radiant energy to work... – With electromagnetic and/or electrostatic removal of...

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118DIG23, 427 17, G03G 1510

Patent

active

039497038

ABSTRACT:
A self-cleaning developer applicator system for applying liquid developer to a latent electrostatic image carried by an organic photoconductor supported on a conductive substrate which moves relative to a developer station in which a biasing potential is applied between the substrate and a conductive developer applicator electrode to reduce the effect of the background potential of the latent image while adequately developing desired image areas together with means for cleaning the applicator electrode continuously during operation of the system to remove toner particles which collect thereon under the influence of the biasing potential. In a preferred embodiment the applicator is arranged to flow a film of developer liquid at the speed of movement of the photoconductive surface over a relatively extended area of the image during development thereof.

REFERENCES:
patent: 3256855 (1966-06-01), Oliphant
patent: 3332396 (1967-07-01), Gundlach
patent: 3376852 (1968-04-01), Weiler
patent: 3437074 (1969-04-01), Hagopian et al.
patent: 3510903 (1970-05-01), Stoever et al.
patent: 3556050 (1971-01-01), Trachtenberg et al.
patent: 3592166 (1971-07-01), Wu
patent: 3669073 (1972-06-01), Savit et al.
patent: 3672329 (1972-06-01), Yamanoi
patent: 3687708 (1972-08-01), Miller
patent: 3707139 (1972-12-01), Fukushima et al.

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