Coating processes – Nonuniform coating – Deforming the base or coating or removing a portion of the...
Reexamination Certificate
2005-05-10
2005-05-10
Feely, Michael J. (Department: 1712)
Coating processes
Nonuniform coating
Deforming the base or coating or removing a portion of the...
C427S156000, C427S259000, C427S271000, C427S275000, C427S282000
Reexamination Certificate
active
06890599
ABSTRACT:
New etch barriers of indium-tin-oxide in the manufacturing process of thin film transistor-liquid crystal display are self-assembled monolayers, such as n-alkylsilanes. A typical process of applying a self-assembled monolayer is to ink a hydrolyzed n-octadecyltrimethoxysilane solution on to a stamp and then to transfer the solution onto ITO. The surface of the stamp may be polar enough to be wet with polar self-assembled monolayer solutions of an akylsilane. A non-polar stamp surface may be treated with oxygen plasma to obtain a wettable polar surface.
REFERENCES:
patent: 6297169 (2001-10-01), Mangat et al.
patent: 6696220 (2004-02-01), Bailey et al.
patent: 20020093122 (2002-07-01), Choi et al.
patent: 20020094496 (2002-07-01), Choi et al.
patent: 20020098426 (2002-07-01), Sreenivasan et al.
patent: 20020150398 (2002-10-01), Choi et al.
patent: 20020164419 (2002-11-01), Fukushima et al.
patent: 20020197879 (2002-12-01), Fukushima et al.
patent: 20040053146 (2004-03-01), Sreenivasan et al.
patent: 20040086793 (2004-05-01), Sreenivasan et al.
patent: 20040141163 (2004-07-01), Bailey et al .
Buchwalter Stephen L.
Fryer Peter M.
Hougham Gareth Geoffrey
Lee Kang-Wook
Ritsko John J.
Feely Michael J.
Intellectual Business Machines Corporation
Marcovici Janik
Morris Daniel P.
Perman & Green LLP
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