Self-assembled monolayer and method of making

Details Self-assembled monolayer and method of making Self-assembled monolayer and method of making

2005-01-25

2005-01-25

Nakarani, D. S. (Department: 1773)

Stock material or miscellaneous articles

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Composite having voids in a component

C428S306600, C428S405000, C428S446000, C428S447000

Reexamination Certificate

active

06846554

ABSTRACT:
According to the present invention, the previously known functional material having a self-assembled monolayer on a substrate has a plurality of assembly molecules each with an assembly atom with a plurality of bonding sites (four sites when silicon is the assembly molecule) wherein a bonding fraction (or fraction) of fully bonded assembly atoms (the plurality of bonding sites bonded to an oxygen atom) has a maximum when made by liquid solution deposition, for example a maximum of 40% when silicon is the assembly molecule, and maximum surface density of assembly molecules was 5 silanes per square nanometer. Note that bonding fraction and surface population are independent parameters. The method of the present invention is an improvement to the known method for making a siloxane layer on a substrate, wherein instead of a liquid phase solution chemistry, the improvement is a supercritical phase chemistry. The present invention has the advantages of greater fraction of oxygen bonds, greater surface density of assembly molecules and reduced time for reaction of about 5 minutes to about 24 hours.

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