Etching a substrate: processes – Forming or treating article containing magnetically...
Reexamination Certificate
2006-10-10
2006-10-10
Alanko, Anita (Department: 1765)
Etching a substrate: processes
Forming or treating article containing magnetically...
C216S040000, C216S067000, C029S603180, C204S192340, C430S296000
Reexamination Certificate
active
07118680
ABSTRACT:
A method for fabricating a current-perpendicular-to-plane (CPP) giant magnetoresistive (GMR) sensor of the synthetic spin valve type is provided, the method including an electron-beam lithographic process employing both primary and secondary electron absorption and first and second self-aligned lift-off processes for patterning the capped ferromagnetic free layer and the conducting, non-magnetic spacer layer. The sensor so fabricated has reduced resistance and increased sensitivity.
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Co-pending U.S. Appl. No. 10/392,118, filed Mar. 19, 2003, same assignee, “GMR Improvement in CPP Spin Valve Head by Inserting a Current Channeling Layer (CCL)”.
Co-pending U.S. Appl. No. 10/718,373, filed Nov. 20, 2003, same assignee, “Method of Increasing CPP GMR in a Spin Valve Structure.”, now U.S. 7,016,168.
Chang Jei-Wei
Chen Chao-Peng
Ju Kochan
Li Min
Ackerman Stephen B.
Alanko Anita
Headway Technologies Inc.
Saile Ackerman LLC
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