Self-aligning mask

Coating processes – Electrical product produced – Integrated circuit – printed circuit – or circuit board

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

430966, 430967, B05D 306

Patent

active

045768323

ABSTRACT:
A process for forming a self-aligned resist mask over a surface of an alumina ceramic substrate having a conductive molybdenum pattern at said surface by first blanket coating the surface with a negative resist sensitive to aluminum emitting X-rays. A blanket dosing of the substrate with resist insensitive X-rays occurs to induce X-ray emission by the aluminum of said substrate to penetrate said resist. The aluminum X-ray emission is screened by said molybdenum pattern at the surface and the resist adjacent the surface molybdenum pattern is penetrated by the aluminum X-ray emission. The resist is developed for removal thereof over the molybdenum pattern while retaining the resist doped by said aluminum X-ray emission. Further metalization can be accomplished by evaporation or sputtering to blanket coat the developed resist with a conductive metal followed by removal of the resist with the metal coating thereon such that the metal coating is retained on the molybdenum pattern.

REFERENCES:
patent: 3742229 (1973-06-01), Smith et al.
patent: 3742230 (1973-06-01), Spears et al.
patent: 4018938 (1977-04-01), Feder et al.
patent: 4022927 (1977-05-01), Pfeiffer et al.
patent: 4349621 (1982-09-01), Cline
patent: 4379833 (1983-04-01), Canavello et al.
"Handbook of Chemistry and Physics", pp. E-111, E-112, The Chemical Rubber Co., Cleveland, Ohio (1964).

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Self-aligning mask does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Self-aligning mask, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Self-aligning mask will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-2305382

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.