Self-aligned process for nanotube/nanowire FETs

Active solid-state devices (e.g. – transistors – solid-state diode – Thin active physical layer which is – Heterojunction

Reexamination Certificate

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Details

C257S009000, C257S347000, C257SE29245, C257SE29168, C257SE49003, C977S938000

Reexamination Certificate

active

07598516

ABSTRACT:
A complementary metal oxide semiconductor (CMOS) device, e.g., a field effect transistor (FET), that includes at least one one-dimensional nanostructure that is typically a carbon-based nanomaterial, as the device channel, and a metal carbide contact that is self-aligned with the gate region of the device is described. The present invention also provides a method of fabricating such a CMOS device.

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