Self-aligned process for fabricating imprint templates...

Etching a substrate: processes – Nongaseous phase etching of substrate

Reexamination Certificate

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C216S026000, C216S067000, C438S745000

Reexamination Certificate

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07547398

ABSTRACT:
A process that enables coplanarization of the structures that have been created in multiple independent etch steps. The various etches are performed independently by selectively exposing only certain patterns to particular etching conditions. After these structures have been created, it is possible that the various structures will exist at different planes/elevations relative to the template surface. The elevations of the various structures may be adjusted independently by selectively exposing “higher” structures to an anisotropic etch that reduces the overall elevation of the structures, while preserving the structural topography.

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