Self-aligned, planar heterojunction bipolar transistor

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357 16, 357 67, 357 68, 357 91, H01L 2972, H01L 2348, H01L 29161

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051594234

ABSTRACT:
A heterojunction bipolar transistor (HBT) is formed with self-aligned base-emitter and base-collector junctions by forming a two-level mask over a doped base layer, sequentially forming openings in registration through the two mask layers, and using the opening in one mask layer to define the collector region and the opening in the other mask layer to define the emitter. A buried conductive layer formed by a dopant implant establishes an electrical contact to the collector region, and connects to the surface via another conductive implant that extends through a lateral extension of the collector region. The collector region itself is formed by a dopant implant, while the active base region which forms junctions with the emitter and collector is thinner than the remainder of the base layer; the latter feature reduces the resistivity associated with connections to lateral base contacts. Parasitic capacitances are minimized when the collector and buried conductive layers are implanted into a semi-insulating substrate such that only the active junction regions overlap.

REFERENCES:
patent: 4683487 (1987-07-01), Ueyanagi et al.
Appl. Phys. Lett., 52(10), Mar. 7, 1988, "GaAs-Si Heterojunction Bipolar Transistor", J. Chen et al., pp. 822-824.
GaAs IC Symposium, IEEE Technical Digest 1985, Catalogue No. 85CH2182, pp. 53-56, "A Self-Aligned GaAs/AlGaAs Heterojunction Bipolar Transistor", T. Ohshima et al.
Chang et al., "AlGaAs/GaAs Heterojunction Bipolar Transistors, Fabricated Using a Self-Aligned Dual-Lift-Off Process", IEEE Electron Device Letts., vol. EDL-8, No. 7, Jul. 1987, pp. 303-305.
Nakajima et al., "High Speed AlGaAs/GaAs HBTs with Proton Implanted Buried Layers", IEDM Tech. Dig., Dec. 1986, pp. 266-269.
Tully et al., "A Fully Planar Heterojunction Bipolar Transistor", IEEE Electron Device Letts., vol. EDL-7, No. 11, Nov. 1986, pp. 615-617.

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