Self-aligned phase shifter formation

Details Self-aligned phase shifter formation Self-aligned phase shifter formation

1992-08-13

1993-12-07

McCamish, Marion E.

Radiation imagery chemistry: process, composition, or product th

Radiation modifying product or process of making

Radiation mask

156653, G03F 900

Patent

active

052682447

ABSTRACT:
The process of fabricating the phase-shifting photomask includes forming on a substrate a patterned metal layer having vertical and horizontal surfaces. A substantially uniform phase-shifting material is deposited over the patterned metal layer surfaces. The phase-shifting material anisotropically etched to substantially remove the material from the horizontal surfaces and to substantially leave in place the material on the vertical or sidewall surfaces of metal layer to form phase shifter sidewall structures on the vertical or sidewall surfaces to form the phase shifting photomask without use of photoresist lithography in the formation of the phase shifter sidewall structures.

REFERENCES:
patent: 5045417 (1991-09-01), Okamoto

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