Self-aligned method of micro-machining field emission display mi

Details Self-aligned method of micro-machining field emission display mi Self-aligned method of micro-machining field emission display mi

1996-12-06

1998-11-17

Ramsey, Kenneth J.

Electric lamp or space discharge component or device manufacturi

Process

With assembly or disassembly

445 50, H01J 902

Patent

active

058367993

ABSTRACT:
A method of fabricating electron emission structures 28 having enhanced emission characteristics. The method comprises the steps of providing a substrate 10 having electron emission structures 5 thereon and having a layer 5" over the electron emission structures. The layer 5" having apertures 30 in alignment with said electron emission structures 5. Then modifying the electron emission structures 5 through the apertures 30 with a directional ion milling beam; thereby creating modified electron emission structures 17,29 with enhanced emission efficiency.

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Journal of Vacuum Science & Technology B, Bozler, Carl O., Harris, Christopher T., Rabe, Steven, Rathman, Dennis D., Hollis, Mark A., and Smith, Henry I., "Arrays of gated field-emitter cones having 0.32 =.mu.m tip-to-tip spacing", pp. 629-632, vol. 12, No. 2, Mar./Apr. 1994.
Journal of Vacuum Science & Technology B, Zhirnov, V. V., and Givargizov, E.I., "Chemical vapor deposition and plasma-enhanced chemical vapor deposition carbonization of silicon microtips", pp. 633-637, vol. 12, No. 2, Mar./Apr. 1994.

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