Self-aligned metal field effect transistor integrated circuit

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

357 59, 357 51, 357 50, 357 239, 357 71, 357 68, 357 236, H01L 2994, H01L 2976

Patent

active

045133034

ABSTRACT:
A self-aligned metal field effect transistor is described which achieves self-aligned metal to silicon contacts and submicron contact-to-contact and metal-to-metal spacing for field effect transistor integrated circuits. The insulation between the contacts and the metal is a pattern of dielectric material having a thickness dimension in the order of a micron or less. The metal and dielectric structure is substantially planar.

REFERENCES:
patent: 4037307 (1977-07-01), Smith
patent: 4209349 (1980-06-01), Ho et al.
patent: 4209350 (1980-06-01), Ho et al.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Self-aligned metal field effect transistor integrated circuit does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Self-aligned metal field effect transistor integrated circuit, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Self-aligned metal field effect transistor integrated circuit will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-38994

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.