Patent
1991-06-27
1992-07-28
Wojciechowicz, Edward J.
357 49, 357 52, 357 55, 357 68, H01L 2972
Patent
active
051344548
ABSTRACT:
An integrated circuit vertical bipolar transistor includes monocrystalline emitter, base and collector contacts for electrically contacting the transistor's emitter, base and collector regions, respectively. The collector, base contact and emitter contact are preferably insulated from one another by oxide regions which are formed from the monocrystalline collector and monocrystalline base contacts. Since all of the contacts are formed of monocrystalline material and the oxide isolation is formed from monocrystalline material, high performance devices are formed. The process of forming the transistor self aligns the base to the collector and the emitter to the base. The monocrystalline base contact is also self aligned to the base and the monocrystalline emitter contact is self aligned to the emitter. The process preferably uses epitaxial lateral overgrowth and selective epitaxial growth from a mesa region to form the monocrystalline contacts. A shallow phosphorus implant into the base contact is used to preferentially grow the oxide between the base contact and emitter contact.
REFERENCES:
patent: 4967252 (1990-10-01), Awano
patent: 4975381 (1990-12-01), Taka et al.
patent: 4982257 (1991-01-01), Akbar et al.
Glenn, Jr. Jack L.
Neudeck Gerold W.
Purdue Research Foundation
Wojciechowicz Edward J.
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