Self-aligned gate field effect transistor and method for making

Metal working – Method of mechanical manufacture – Assembling or joining

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Details

29579, 29580, 357 15, 357 22, B01J 1700

Patent

active

040771113

ABSTRACT:
A self-aligned gate field effect transistor is described which is capable of operating at high frequencies. A method for making the transistor is described which comprises plating metal partially over an oxide layer, then removing the oxide to produce an overlapping metal portion and then plating again to produce a gate contact between the overlapping metal portions.

REFERENCES:
patent: 3855690 (1974-12-01), Kim
patent: 3861024 (1975-01-01), Napoli
patent: 3866310 (1975-02-01), Driver
patent: 3906541 (1975-09-01), Goronkin
patent: 4040168 (1977-08-01), Huang

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