Active solid-state devices (e.g. – transistors – solid-state diode – Combined with electrical contact or lead – Of specified material other than unalloyed aluminum
Patent
1999-01-06
2000-05-09
Monin, Jr., Donald L.
Active solid-state devices (e.g., transistors, solid-state diode
Combined with electrical contact or lead
Of specified material other than unalloyed aluminum
257208, 438631, 438638, H01L 2348
Patent
active
060607831
ABSTRACT:
Within an integrated circuit, a contact plug with a height not extending above the level of the gate/wordline nitride is nonetheless provided with a relatively large contact area or landing pad, significantly larger than the source/drain region to which the contact plug is electrically connected. Methods for producing the inventive contact plug include (1) use of a nitride facet etch, either (a) during a nitride spacer formation etch or (b) during a BPSG etch; (2) using at least one of (a) an isotropic photoresist etch or partial descum to narrow BPSG spacers above the gate/wordline nitride, and (b) a nitride step etch to etch the shoulder area of the gate/wordline nitride exposed by a BPSG etch; and (3) polishing a BPSG layer down to the top of a gate/wordline nitride before any doped polysilicon plug fill, masking for BPSG etch and performing a BPSG etch, etching the photoresist layer through a partial descum, and etching the shoulder area of the gate/wordline nitride exposed thereby.
REFERENCES:
patent: 3996657 (1976-12-01), Simko et al.
patent: 4784719 (1988-11-01), Schutz
patent: 5014098 (1991-05-01), Schlais et al.
patent: 5116460 (1992-05-01), Bukhman
patent: 5234852 (1993-08-01), Liou
patent: 5236549 (1993-08-01), Shirakawa et al.
patent: 5304829 (1994-04-01), Mori et al.
patent: 5378646 (1995-01-01), Huang et al.
patent: 5420075 (1995-05-01), Homma et al.
patent: 5500816 (1996-03-01), Kobayashi
patent: 5517044 (1996-05-01), Koyama
patent: 5705838 (1998-01-01), Jost et al.
patent: 5751039 (1998-05-01), Kauffman et al.
Haller Gordon
Juengling Werner
Keller David
Lowrey Tyler
Prall Kirk
Micron Technology Inc
Monin, Jr. Donald L.
LandOfFree
Self-aligned contact plugs does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Self-aligned contact plugs, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Self-aligned contact plugs will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-1067848