Self-aligned channel stop

Details Self-aligned channel stop Self-aligned channel stop

1985-10-31

1989-04-25

Hearn, Brian E.

Fishing, trapping, and vermin destroying

437 63, 437228, 437225, H01L 21265

Patent

active

048247979

ABSTRACT:
Disclosed is a process of forming channel stops which starts with a, for example, N type silicon substrate having on the surface thereof an insulator trench mask defining the region of silicon where an isolation trench is desired. A blockout layer having an opening in correspondence with the portion of the would-be silicon mesa where a channel stop is desired is formed. N type dopant is introduced into the exposed silicon followed by an anneal step to and vertically diffuse the dopant into the silicon body. The exposed silicon is etched forming a deep trench which delineates silicon mesa having at a section of the peripheral portion thereof a shallow and highly N doped region. Upon forming a pair of highly P doped regions on either side of the shallow highly N doped region, the latter functions as a channel stop to arrest charge leakage between the P doped regions due to parasitic FET action at the trench walls.

REFERENCES:
patent: 4024564 (1977-05-01), Shimada et al.
patent: 4104086 (1978-08-01), Bondur et al.
patent: 4137109 (1979-01-01), Aiken et al.
patent: 4261763 (1981-04-01), Kumar et al.
patent: 4298881 (1981-11-01), Sakurada et al.
patent: 4381953 (1983-05-01), Ho et al.
patent: 4430663 (1984-02-01), D'Altroy et al.
patent: 4470062 (1984-09-01), Muramatsu
patent: 4502913 (1985-03-01), Lechaton et al.
patent: 4538343 (1985-09-01), Pollack et al.
Ghandhi, S. K. "VLSI Fabrication Processes" 1983 pp. 346-353, 570, 316.
Colclaser, R. A., "Micro electronics processing and Design" 1980, pp. 152-155.

Affiliated with

Also associated with

Rating

Self-aligned channel stop does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Self-aligned channel stop, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Self-aligned channel stop will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-1195658