Selectively-etched nanochannel electrophoretic and...

Details Selectively-etched nanochannel electrophoretic and... Selectively-etched nanochannel electrophoretic and...

2006-06-27

2006-06-27

Tran, Mai-Huong (Department: 2818)

Semiconductor device manufacturing: process

Packaging or treatment of packaged semiconductor

Assembly of plural semiconductive substrates each possessing...

C438S245000, C438S607000, C257SE21586, C257S751000, C257S499000, C427S250000, C427S252000, C427S255150, C427S255230, C427S255260, C427S255280, C427S255700

Reexamination Certificate

active

07067351

ABSTRACT:
Nanochannel electrophoretic and electrochemical devices having selectively-etched nanolaminates located in the fluid transport channel. The normally flat surfaces of the nanolaminate having exposed conductive (metal) stripes are selectively-etched to form trenches and baffles. The modifications of the prior utilized flat exposed surfaces increase the amount of exposed metal to facilitate electrochemical redox reaction or control the exposure of the metal surfaces to analytes of large size. These etched areas variously increase the sensitivity of electrochemical detection devices to low concentrations of analyte, improve the plug flow characteristic of the channel, and allow additional discrimination of the colloidal particles during cyclic voltammetry.

REFERENCES:
patent: 6902763 (2005-06-01), Elers et al.

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