Selective shield/material flow mechanism

Electrolysis: processes – compositions used therein – and methods – Electrolytic coating – Controlling current distribution within bath

Reexamination Certificate

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

C205S133000, C205S157000, C204S22400M, C427S304000, C427S437000, C427S443100

Reexamination Certificate

active

10813351

ABSTRACT:
An apparatus and method for plating a workpiece. The apparatus comprises, generally, an anode, a cathode, and a selective anode shield/material flow assembly. In use, both the anode and the cathode are immersed in a solution, and the cathode is used to support the workpiece. During an electroplating process, the anode and the cathode generate an electric field emanating from the anode towards the cathode, to generate a corresponding current to deposit an electroplating material on the workpiece. The selective shield/material flow assembly is located between the anode and the cathode, and forms a multitude of adjustable openings. These opening have sizes that are adjustable during the electroplating process for selectively and controllably adjusting the amount of electric flux passing through the selective shield/material flow assembly and the distribution of the electroplating material on the workpiece. The selective shield/material flow assembly can also be used with an electroless plating system. At least one selective shield material flow mechanism is used in a selective shield material flow assembly.

REFERENCES:
patent: 4304641 (1981-12-01), Grandia et al.
patent: 5281325 (1994-01-01), Berg
patent: 5776327 (1998-07-01), Botts et al.
patent: 5985123 (1999-11-01), Koon
patent: 2003/0038035 (2003-02-01), Wilson et al.
patent: 1-147627 (1989-06-01), None

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Selective shield/material flow mechanism does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Selective shield/material flow mechanism, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Selective shield/material flow mechanism will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-3823389

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.