Selective removal of material using self-initiated galvanic acti

Details Selective removal of material using self-initiated galvanic acti Selective removal of material using self-initiated galvanic acti

1997-09-30

1999-12-28

Valentine, Donald R.

Electrolysis: processes, compositions used therein, and methods

Electrolytic erosion of a workpiece for shape or surface...

Internal battery action

216 90, 216 95, 216100, 438746, 438754, B23H 1100, C23F 100

Patent

active

06007695&

ABSTRACT:
Material of a given chemical type is selectively electrochemically removed from a structure by subjecting portions of the structure to an electrolytic bath. The characteristics of certain parts of the structure are chosen to have electrochemical reduction half-cell potentials that enable removal of the undesired material to be achieved in the bath without applying external potential to any part of the structure. The electrolytic bath can be implemented with liquid that is inherently corrosive to, or inherently benign to, material of the chemical type being selectively removed.

REFERENCES:
patent: 2334699 (1943-11-01), Faust
patent: 3174920 (1965-03-01), Post
patent: 3407125 (1968-10-01), Fehlner
patent: 3483108 (1969-12-01), Schaefer
patent: 3539408 (1970-11-01), Cashau et al.
patent: 3755704 (1973-08-01), Spindt et al.
patent: 4208257 (1980-06-01), Hom-ma et al.
patent: 4836888 (1989-06-01), Nojiri et al.
patent: 5185057 (1993-02-01), Playdon
patent: 5217586 (1993-06-01), Datta et al.
patent: 5256565 (1993-10-01), Bernhardt et al.
patent: 5458520 (1995-10-01), DeMercurio et al.
patent: 5462467 (1995-10-01), Macaulay et al.
patent: 5559389 (1996-09-01), Spindt et al.
patent: 5564959 (1996-10-01), Spindt et al.
patent: 5766446 (1998-06-01), Spindt et al.
Brodie et al, "Vacuum Microelectronics," Advances in Electronics and Electron Physics, vol. 83, 1992, pp. 1-106 (No Month).
Busta, "Vacuum Microelectronics-1992," J. Micromech. Microeng., vol. 2, 1992, pp. 43-74. (No Month).
Datta et al, "Film Breakdown on Nickel under Transpassive Dissolution Conditions in Sodium Nitrate Solutions," J. Electrochem. Soc.: Electrochemical Science and Technology, Apr. 1977, vol. 124, No. 4, pp. 483-489.
Datta et al, "On the Influence of Electrolyte Concentraion, pH and Temperature on Surface Brightening of Nickel under ECM Conditions," J. Applied Electrochemistry, 1977, pp. 247-252. (No Month).
Datta et al, "On the Role of Mass Transport in High Rate Dissolution of Iron and Nickel in ECM Electrolytes-I. Chloride Solutions," Electrochimica Acta, 1980, vol. 25, pp. 1255-1262.
Datta et al, "Surface Brightening During High Rate Nickel Dissolution in Nitrate Electrolytes," J. Electrochem. Soc.: Electrochemical Science and Technology, Nov. 1975, pp. 1466-1472.
LaBoda et al, "ECM of Nickel in NaClO.sub.3 Solution," J. Electrochem. Soc.: Electrochemical Science and Technology, vol. 120, No. 5, May 1973, pp. 643-646.
Landolt et al, "High Rate Anodic Dissolution of Copper," J. Electrochem. Soc.: Electrochemical Science, vol. 116, No. 10, Oct. 1969, pp. 1384-1390.
Vaudaine et al, "`Microtips` Fluorescent Display," Technical Digest, 1991 International Electron Devices Meeting, Dec. 8-11, 1991, pp. 8.1.1-8.1.4.

Affiliated with

Also associated with

Rating

Selective removal of material using self-initiated galvanic acti does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Selective removal of material using self-initiated galvanic acti, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Selective removal of material using self-initiated galvanic acti will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-2380006