Coating processes – Coating by vapor – gas – or smoke – Metal coating
Patent
1993-11-19
1995-03-07
Lusignan, Michael
Coating processes
Coating by vapor, gas, or smoke
Metal coating
427125, 427252, 427255, 4272557, 427265, 427266, 427301, 427307, 427405, 427534, 427535, C23C 1600
Patent
active
053956508
ABSTRACT:
Gold can be selectively deposited onto a catalytically-activated region on a surface of a workpiece in the presence of a catalytically-inactive region on the surface by a chemical vapor deposition method. The method involves placing the workpiece in a vacuum chamber and evacuating the vacuum chamber to a base pressure equal to or less than a catalyst-activity-preserving upper pressure limit to eliminate effectively gaseous catalyst-deactivating contaminants from the chamber. The surface composition of at least one region of a target surface of the workpiece is altered to produce a catalytically-activated region on the target surface. At least one region of the target surface disjoint from the catalytically-activated region is a catalytically-inactive region. A gaseous alkylated (trialkylphosphine)gold compound is introduced into the vacuum chamber to expose the target surface of the workpiece to the compound. The vacuum chamber is essentially continuously evacuated during exposure of the target surface to the gold-containing compound to maintain the vacuum chamber effectively free of gaseous catalyst-deactivating contaminants and to sweep gaseous reaction products from the vacuum chamber. The vacuum chamber is maintained effectively free of gaseous reducing agents during exposure of the target surface to the gold-containing compound. The target surface of the workpiece is maintained at a selective-deposition temperature which is effective to induce the gaseous gold-containing compound to deposit gold on the catalytically-activated regions of the target surface and to inhibit the compound from depositing gold on the catalytically-inactive regions of the target surface.
REFERENCES:
patent: 4714627 (1987-12-01), Puddephatt et al.
patent: 5019531 (1991-05-01), Awaya et al.
S. J. Kirch et al., "Spontaneous Decomposition of Dimethyl Gold . . . ", J. Vac. Sci. Technol., A8(5), Sep./Oct. 1990, pp. 3701-3705.
Colgate et al., "Area Selective Metalorganic Chemical Vapor Deposition of Gold on Tungsten Patterned on Silicon", J. Vac. Sci. Tech., A8(3), May/Jun. 1990.
Holl Mark M. B.
Kowalczyk Steven P.
McFeely Fenton R.
Seidler Paul F.
International Business Machines - Corporation
Lusignan Michael
Maiorana David M.
Morris Daniel P.
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