Selective insulation etching for fabricating superconductor micr

Details Selective insulation etching for fabricating superconductor micr Selective insulation etching for fabricating superconductor micr

1994-10-05

1997-07-08

Dang, Thi

Superconductor technology: apparatus, material, process

Processes of producing or treating high temperature...

Semiconductor device or thin film electric solid-state...

505410, 505413, 505728, 216 13, 216 95, 216101, 216109, H01L 2100

Patent

active

056460953

ABSTRACT:
A method for selectively etching insulative material composed of SrTiO3 or MgO in the presence of a copper oxide perovskite superconductive material includes treating the insulative material with a liquid selective etchant solution containing hydrogen fluoride in water for a period of time, the insulative material being etched at a substantially faster rate than the superconductive material etch rate, then treating the superconductive material exposed to the insulative selective with another etchant to remove a surface layer.

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