Selective etching of aluminum

Details Selective etching of aluminum Selective etching of aluminum

1983-01-03

1984-07-31

Demers, Arthur P.

Chemistry: electrical and wave energy

Processes and products

Vacuum arc discharge coating

156643, 204192EC, C03C 1500

Patent

active

044628820

ABSTRACT:
A process for selectively etching an aluminum-containing coating in preference to a masking material on a surface of the aluminum-containing coating by positioning a patterned masking material on the aluminum-containing coating in a radio frequency plasma etching chamber and introducing an etchant gas and a source of oxygen and silicon to the interior of the chamber under conditions where silicon dioxide is deposited selectively on masking material layer while the unmasked aluminum-containing coating is etched.

REFERENCES:
patent: 4303467 (1981-12-01), Scornavacca
patent: 4360414 (1982-11-01), Beinvogl
patent: 4361599 (1982-11-01), Wourms
patent: 4364793 (1982-12-01), Graves
patent: 4370196 (1983-01-01), Vossen
patent: 4373990 (1983-02-01), Porter

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