Chemistry: electrical and wave energy – Processes and products – Electrostatic field or electrical discharge
Patent
1993-10-27
1994-12-20
Valentine, Donald R.
Chemistry: electrical and wave energy
Processes and products
Electrostatic field or electrical discharge
20412975, 20412995, C25F 304, C25F 302, C25F 306, C25F 314
Patent
active
053743385
ABSTRACT:
The present invention relates to a method for selectively electroetching a metal from an electrical device having the steps of: immersing the electrical device in an etching solution; immersing a cathode in the etching solution; applying an etching potential to a preselected area of the metal; and maintaining a passivation potential at the metal to remain unetched. The metal to remain unetched is not electrically connected to the preselected area and the passivation potential does not equal the etching potential.
The present invention further relates to a method of forming an electrical connection to the inner layers of a multilayer circuit board having a copper foil surface layer and copper containing inner layers.
REFERENCES:
patent: 3562040 (1971-02-01), Garies
patent: 3701698 (1972-10-01), Forestek
patent: 3785945 (1974-01-01), MacArthur
patent: 4022619 (1977-05-01), Pagliaro et al.
patent: 4078980 (1978-03-01), Harris et al.
patent: 4303482 (1981-12-01), Buhne et al.
patent: 4588471 (1986-05-01), Griffith et al.
patent: 4765865 (1988-08-01), Gealer et al.
patent: 4783237 (1988-11-01), Aine et al.
patent: 5167778 (1992-12-01), Kaneko et al.
Boyko Christina M.
Carpenter Richard W.
Galasco Raymond T.
Semkow Krystyna W.
Wegener Herbert
International Business Machines - Corporation
Valentine Donald R.
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