Active solid-state devices (e.g. – transistors – solid-state diode – With means to control surface effects – Insulating coating
Patent
1996-09-13
1998-02-03
Saadat, Mahshid D.
Active solid-state devices (e.g., transistors, solid-state diode
With means to control surface effects
Insulating coating
257702, 257634, H01L 2358
Patent
active
057147981
ABSTRACT:
Disclosed is a process for depositing a conformal polymer coating on selected areas of a silicon substrate. The substrate is first exposed through a mask to a gaseous plasma so as to form a film of desired pattern, the plasma comprising a compound having strong electron donating characteristics. Then, the patterned film and the remaining substrate not covered by the film are exposed to the vapor of a monomer, which condenses and polymerizes on the exposed substrate surfaces, but not on the film. The film serves to inhibit substantial deposition of the coating, so as to provide a selective deposition, where the coating is formed only on those areas of the substrate where desired.
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Armacost Michael David
Grundon Steven Alfred
Harmon David Laurant
Nguyen Son Van
Rembetski John Francis
Chadurjian Mark F.
Clark S. V.
International Business Machines Corp.
Saadat Mahshid D.
Sabo William D.
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