Selective deposition of noble metal thin films

Details Selective deposition of noble metal thin films Selective deposition of noble metal thin films

2006-03-14

2010-02-23

Kebede, Brook (Department: 2894)

Semiconductor device manufacturing: process

Coating with electrically or thermally conductive material

C438S585000, C438S758000, C257SE21637

Reexamination Certificate

active

07666773

ABSTRACT:
Processes are provided for selectively depositing thin films comprising one or more noble metals on a substrate by vapor deposition processes. In some embodiments, atomic layer deposition (ALD) processes are used to deposit a noble metal containing thin film on a high-k material, metal, metal nitride or other conductive metal compound while avoiding deposition on a lower k insulator such as silicon oxide. The ability to deposit on a first surface, such as a high-k material, while avoiding deposition on a second surface, such as a silicon oxide or silicon nitride surface, may be utilized, for example, in the formation of a gate electrode.

REFERENCES:
patent: 4058430 (1977-11-01), Suntola et al.
patent: 4477296 (1984-10-01), Nair
patent: 4670110 (1987-06-01), Withers et al.
patent: 4860687 (1989-08-01), Frijlink
patent: 4902551 (1990-02-01), Nakaso et al.
patent: 4965656 (1990-10-01), Koubuchi et al.
patent: 5106454 (1992-04-01), Allardyce et al.
patent: 5382333 (1995-01-01), Ando et al.
patent: 5391517 (1995-02-01), Gelatos et al.
patent: 5453494 (1995-09-01), Kirlin et al.
patent: 5637533 (1997-06-01), Choi
patent: 5695810 (1997-12-01), Dubin et al.
patent: 5711811 (1998-01-01), Suntola et al.
patent: 5731634 (1998-03-01), Matsuo et al.
patent: 5820664 (1998-10-01), Gardiner et al.
patent: 5865365 (1999-02-01), Nishikawa et al.
patent: 5884009 (1999-03-01), Okase
patent: 5916365 (1999-06-01), Sherman
patent: 5923056 (1999-07-01), Lee et al.
patent: 5939334 (1999-08-01), Nguyen et al.
patent: 5989672 (1999-11-01), Hayashi
patent: 5998048 (1999-12-01), Jin et al.
patent: 6006763 (1999-12-01), Mori et al.
patent: 6015986 (2000-01-01), Schuegraf
patent: 6033584 (2000-03-01), Ngo et al.
patent: 6040243 (2000-03-01), Li et al.
patent: 6063705 (2000-05-01), Vaartstra
patent: 6066892 (2000-05-01), Ding et al.
patent: 6074945 (2000-06-01), Vaartstra et al.
patent: 6108937 (2000-08-01), Raaijmakers
patent: 6124189 (2000-09-01), Watanabe et al.
patent: 6130123 (2000-10-01), Liang et al.
patent: 6133159 (2000-10-01), Vaartstra et al.
patent: 6136163 (2000-10-01), Cheung et al.
patent: 6139700 (2000-10-01), Kang et al.
patent: 6143658 (2000-11-01), Donnelly et al.
patent: 6144060 (2000-11-01), Park et al.
patent: 6171910 (2001-01-01), Hobbs et al.
patent: 6203613 (2001-03-01), Gates et al.
patent: 6268291 (2001-07-01), Andricacos et al.
patent: 6270572 (2001-08-01), Kim et al.
patent: 6281125 (2001-08-01), Vaartstra et al.
patent: 6294467 (2001-09-01), Yokoyama et al.
patent: 6297539 (2001-10-01), Ma et al.
patent: 6303500 (2001-10-01), Jiang et al.
patent: 6305314 (2001-10-01), Sneh et al.
patent: 6306756 (2001-10-01), Hasunuma et al.
patent: 6320213 (2001-11-01), Kirlin et al.
patent: 6323131 (2001-11-01), Obeng et al.
patent: 6335280 (2002-01-01), Van der Jeugd
patent: 6342277 (2002-01-01), Sherman
patent: 6346151 (2002-02-01), Jiang et al.
patent: 6359159 (2002-03-01), Welch
patent: 6380080 (2002-04-01), Visokay
patent: 6391785 (2002-05-01), Satta et al.
patent: 6395650 (2002-05-01), Callegari et al.
patent: 6403414 (2002-06-01), Marsh
patent: 6404191 (2002-06-01), Daughton et al.
patent: 6420189 (2002-07-01), Lopatin
patent: 6433432 (2002-08-01), Shimizu
patent: 6444568 (2002-09-01), Sundararajan et al.
patent: 6444868 (2002-09-01), Vaughn et al.
patent: 6455424 (2002-09-01), McTeer et al.
patent: 6464779 (2002-10-01), Powell et al.
patent: 6475276 (2002-11-01), Elers et al.
patent: 6478931 (2002-11-01), Wadley et al.
patent: 6482733 (2002-11-01), Raaijmakers et al.
patent: 6482740 (2002-11-01), Soininen et al.
patent: 6511539 (2003-01-01), Raaijmakers
patent: 6534395 (2003-03-01), Werkhoven et al.
patent: 6541067 (2003-04-01), Marsh et al.
patent: 6551399 (2003-04-01), Shen et al.
patent: 6576053 (2003-06-01), Kim et al.
patent: 6593656 (2003-07-01), Ahn et al.
patent: 6617173 (2003-09-01), Shen
patent: 6649091 (2003-11-01), Ryan et al.
patent: 6656748 (2003-12-01), Hall et al.
patent: 6664192 (2003-12-01), Satta et al.
patent: 6679951 (2004-01-01), Soininen et al.
patent: 6680540 (2004-01-01), Nakano et al.
patent: 6703708 (2004-03-01), Werkhoven et al.
patent: 6720262 (2004-04-01), Koh et al.
patent: 6759325 (2004-07-01), Raaijmakers et al.
patent: 6777331 (2004-08-01), Nguyen
patent: 6784101 (2004-08-01), Yu et al.
patent: 6784504 (2004-08-01), Derderian et al.
patent: 6800542 (2004-10-01), Kim
patent: 6800567 (2004-10-01), Cho et al.
patent: 6824816 (2004-11-01), Aaltonen et al.
patent: 6842740 (2005-01-01), Jeran et al.
patent: 6849122 (2005-02-01), Fair
patent: 6852635 (2005-02-01), Satta et al.
patent: 6878628 (2005-04-01), Sophie et al.
patent: 6881260 (2005-04-01), Marsh et al.
patent: 6881437 (2005-04-01), Ivanov et al.
patent: 6887795 (2005-05-01), Soininen et al.
patent: 6921712 (2005-07-01), Soininen et al.
patent: 6936535 (2005-08-01), Kim et al.
patent: 6955986 (2005-10-01), Li
patent: 6984591 (2006-01-01), Buchanan et al.
patent: 7011981 (2006-03-01), Kim et al.
patent: 7067407 (2006-06-01), Kostamo et al.
patent: 7438949 (2006-07-01), Weidman
patent: 7105054 (2006-09-01), Lindfors
patent: 7107998 (2006-09-01), Greer et al.
patent: 7118779 (2006-10-01), Verghese et al.
patent: 7135207 (2006-11-01), Min et al.
patent: 7220669 (2007-05-01), Hujanen et al.
patent: 7241677 (2007-07-01), Soininen et al.
patent: 7256144 (2007-08-01), Koyanagi et al.
patent: 7273526 (2007-09-01), Shinriki et al.
patent: 7273814 (2007-09-01), Tsukasa
patent: 7300873 (2007-11-01), Millward
patent: 7404985 (2008-07-01), Chang et al.
patent: 7435484 (2008-10-01), Shinriki et al.
patent: 7494927 (2009-02-01), Kostamo et al.
patent: 2001/0003064 (2001-06-01), Ohto
patent: 2001/0013617 (2001-08-01), Toyoda et al.
patent: 2001/0018266 (2001-08-01), Jiang et al.
patent: 2001/0030366 (2001-10-01), Nakano et al.
patent: 2001/0052318 (2001-12-01), Jiang et al.
patent: 2002/0004293 (2002-01-01), Soininen et al.
patent: 2002/0006711 (2002-01-01), Yamazaki et al.
patent: 2002/0013487 (2002-01-01), Norman et al.
patent: 2002/0027286 (2002-03-01), Sundararajan et al.
patent: 2002/0173054 (2002-11-01), Kim
patent: 2003/0013302 (2003-01-01), Nguyen
patent: 2003/0135061 (2003-07-01), Norman et al.
patent: 2003/0165615 (2003-09-01), Aaltonen et al.
patent: 2003/0214043 (2003-11-01), Saitoh et al.
patent: 2003/0233976 (2003-12-01), Marsh et al.
patent: 2004/0005753 (2004-01-01), Kostamo et al.
patent: 2004/0038529 (2004-02-01), Soininen et al.
patent: 2004/0053496 (2004-03-01), Choi
patent: 2004/0082125 (2004-04-01), Hou et al.
patent: 2004/0087143 (2004-05-01), Norman et al.
patent: 2004/0105934 (2004-06-01), Chang et al.
patent: 2004/0118697 (2004-06-01), Wen et al.
patent: 2004/0126944 (2004-07-01), Pacheco Rotondaro et al.
patent: 2004/0142558 (2004-07-01), Granneman
patent: 2004/0152255 (2004-08-01), Seidl et al.
patent: 2004/0192021 (2004-09-01), Li
patent: 2004/0192036 (2004-09-01), Koyanagi et al.
patent: 2004/0214354 (2004-10-01), Marsh et al.
patent: 2004/0216668 (2004-11-01), Lindfors et al.
patent: 2004/0224475 (2004-11-01), Lee et al.
patent: 2005/0009325 (2005-01-01), Chung et al.
patent: 2005/0020060 (2005-01-01), Aaltonen et al.
patent: 2005/0048794 (2005-03-01), Brask et al.
patent: 2005/0082587 (2005-04-01), Marsh
patent: 2005/0085031 (2005-04-01), Lopatin et al.
patent: 2005/0087879 (2005-04-01), Won et al.
patent: 2005/0089632 (2005-04-01), Vehkamaki et al.
patent: 2005/0092247 (2005-05-01), Schmidt et al.
patent: 2005/0098440 (2005-05-01), Kailasam et al.
patent: 2005/0124154 (2005-06-01), Park et al.
patent: 2005/0181555 (2005-08-01), Haukka et al.
patent: 2005/0208754 (2005-09-01), Kostamo et al.
patent: 2005/0229848 (2005-10-01), Shinriki et al.
patent: 2006/0013955 (2006-01-01), Senzaki
patent: 2006/0035462 (2006-02-01), Millward
patent: 2006/0073276 (2006-04-01), Antonissen
patent: 2006/0093848 (2006-05-01), Senkevich et al.
patent: 2006/0118968 (2006-06-01), Johnston et al.
patent: 2006/0121733 (2006-06-01), Kilpela et al.
patent: 2006/0128150 (2006-06-01), Gandikota et al.
patent: 2006/0137608 (2006-06-01), Choi et al.
patent: 2006/0177601 (2006-08-01), Park et al.
patent: 2006/021693

Affiliated with

Also associated with

Rating

Selective deposition of noble metal thin films does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Selective deposition of noble metal thin films, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Selective deposition of noble metal thin films will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-4205322