Selective deposition of composite materials

Details Selective deposition of composite materials Selective deposition of composite materials

1982-06-02

1984-08-14

Smith, John D.

Coating processes

Electrical product produced

Welding electrode

204192SP, 427 89, 427 93, 427 96, 427259, 427348, 427349, H01L 2121, H01L 21268

Patent

active

044657161

ABSTRACT:
A method for selectively depositing a composite material over high-thermal-conductivity areas (such as silicon) and not over low-thermal-conductivity areas (such as oxide), which does not require any additional patterning step. A composite material, such as TiW is deposited overall by sputtering. A short pulse of light is then applied, and the composite material over the oxide separates and flakes off, while the composite material over the high-thermal-conductivity area remains in place.

REFERENCES:
patent: 4377421 (1983-03-01), Wada
patent: 4388517 (1983-06-01), Schulte
patent: 4395433 (1983-07-01), Nagakubo

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