Radiation imagery chemistry: process – composition – or product th – Radiation modifying product or process of making – Radiation mask
Patent
1997-11-18
1999-07-13
Rosasco, S.
Radiation imagery chemistry: process, composition, or product th
Radiation modifying product or process of making
Radiation mask
430308, 101127, G03F 900
Patent
active
059224967
ABSTRACT:
A material deposition contact mask is disclosed in which apertures formed therein have a larger dimension in lower openings in a bottom side of the mask contacting the substrate than in constricted openings located near the top side of the mask. Apertures of the contact mask have knife edges located within the upper sidewalls thereof, e.g. within the top 25% of the mask thickness above the substrate. A mask is disclosed which, in addition, is thermally compensated to the substrate temperature at which the deposition is performed. Methods for fabricating the mask by differential etching are disclosed.
REFERENCES:
patent: 5359928 (1994-11-01), Blessington et al.
patent: 5593080 (1997-01-01), Tashima et al.
patent: 5634268 (1997-06-01), Dalal et al.
Dalal Hormazdyar Minocher
Gaudenzi Gene Joseph
Pierre Frederic Robert
Robert Georges Henri
International Business Machines - Corporation
Neff, Esq. Daryl K.
Rosasco S.
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