Chemistry: electrical and wave energy – Processes and products – Processes of treating materials by wave energy
Patent
1987-03-09
1988-06-28
Niebling, John F.
Chemistry: electrical and wave energy
Processes and products
Processes of treating materials by wave energy
20415744, 20415745, 20415746, 20415747, C01B 3300, C04B 3552, C04B 3558
Patent
active
047537167
ABSTRACT:
A process for the selective conversion of a polymer coating to a ceramic material is disclosed. This process initially involves the provision of a polymer film which has been generated by R. F. plasma vapor phase polymerization of a monomer comprising an inorganic (i.e. silicon) or an organometallic constituent on a receptive substrate. The polymer is thereafter selectively exposed to a coherent or focused energy source (i.e. CO.sub.2 laser) at the appropriate wavelength and power output to effect in situ conversion of a polymer film to a ceramic deposit which is substantially devoid of carbonaceous impurities. This process is also unique for its ability to provide a ceramic deposit that is firmly adherent on a variety of receptive substrates. The degree of adherence is far superior to ceramic coatings derived by chemical vapor deposition (CVD) techniques. The process lends itself to the formation of ceramic patterns which have application in the microelectronics industry.
REFERENCES:
Cannon et al, J. Am. Ceram. Soc. 65, pp. 324-330 (1982).
Cannon et al, J. Am. Ceram. Soc. 65, pp. 330-335 (1982).
C. L. Beatty, "Silicon Nitride and Silicon Carbide from Organometallic and Vapor Precursors: Ultra Structure Processing of Ceramics, Glasses, and Compositions", editor Hench et al, Chapter 23, pp. 272-292, John Wiley & Son (New York, 1984).
Beatty Charles L.
Eyler John R.
Watson Clifford H.
Faro John H.
Hsing Ben C.
Niebling John F.
University of Florida
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