Selective chemical vapor deposition of polymers

Details Selective chemical vapor deposition of polymers Selective chemical vapor deposition of polymers

1997-10-03

1999-02-09

Beck, Shrive

Coating processes

Coating by vapor, gas, or smoke

Base includes an inorganic compound containing silicon or...

4272556, 427256, 427259, 427261, 427287, 427301, 427304, 427327, C23C 1604

Patent

active

058691359

ABSTRACT:
A system for selective chemical vapor deposition of polymers onto a substrate. A substrate is provided which comprises a plurality of surface regions, wherein the surface of at least one region provides a more favorable nucleation site for at least one of a polymer or polymer precursor than at least one other region. This may be an intrinsic characteristic of the substrate or may be accomplished through surface treatment of a substrate. The substrate is subjected to chemical vapor deposition of a reactive monomer, producing a polymer coating which is substantially thicker in the regions of favorable nucleation than in the regions of unfavorable nucleation.

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