Selective chemical vapor deposition apparatus

Details Selective chemical vapor deposition apparatus Selective chemical vapor deposition apparatus

1985-05-10

1987-03-31

Pianalto, Bernard D.

Coating apparatus

Gas or vapor deposition

With treating means

118 501, 118641, 118724, C23C 1600

Patent

active

046534288

ABSTRACT:
An apparatus is provided for selectively depositing metal films on metal and semiconductive surfaces of a substrate wherein the depositing surface of the substrate is isolated from undesired impinging radiation, such as infrared radiation.

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patent: 3916822 (1975-11-01), Robinson
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patent: 4435445 (1984-03-01), Allred et al.
patent: 4496609 (1985-01-01), McNeilly et al.
patent: 4550684 (1985-11-01), Mahawili

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